Benchmark of rigorous methods for electromagnetic field simulations

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.

[1]  Lin Zschiedrich,et al.  A rigorous finite-element domain decomposition method for electromagnetic near field simulations , 2008, SPIE Advanced Lithography.

[2]  L. Zschiedrich,et al.  Finite element simulation of light propagation in non-periodic mask patterns , 2008, Photomask Japan.

[3]  Lin Zschiedrich,et al.  Rigorous simulation of 3D masks , 2006, SPIE Photomask Technology.

[4]  Thomas Schmoeller,et al.  Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques , 2003, SPIE Advanced Lithography.

[5]  Andreas Erdmann,et al.  Fast near field simulation of optical and EUV masks using the waveguide method , 2007, European Mask and Lithography Conference.

[6]  Lin Zschiedrich,et al.  Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation , 2005, SPIE Photomask Technology.

[7]  Thomas K. Gaylord,et al.  Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach , 1995 .

[8]  Jari Turunen,et al.  Form-birefringence limits of Fourier-expansion methods in grating theory , 1996 .

[9]  Ronald H. W. Hoppe,et al.  Finite element methods for Maxwell's equations , 2005, Math. Comput..

[10]  Andreas Erdmann,et al.  Dr.LiTHO: a development and research lithography simulator , 2007, SPIE Advanced Lithography.

[11]  Kevin D. Lucas,et al.  Efficient and rigorous three-dimensional model for optical lithography simulation , 1996 .

[12]  Feng Shao,et al.  Simulation of larger mask areas using the waveguide method with fast decomposition technique , 2007, SPIE Photomask Technology.

[13]  Lin Zschiedrich,et al.  EMF simulations of isolated and periodic 3D photomask patterns , 2007, SPIE Photomask Technology.

[14]  Frank Schmidt,et al.  Adaptive finite element method for simulation of optical nano structures , 2007, 0711.2149.

[15]  L. Zschiedrich,et al.  ar X iv : p hy si cs / 0 61 02 18 v 1 2 4 O ct 2 00 6 Rigorous Simulation of 3 D Masks , 2006 .