Structural and electrical correlation in aluminum nitride thin films grown by plasma enhanced atomic layer deposition as interface insulating layers on silicon carbide (4H-SiC)
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Z. Fogarassy | C. Bongiorno | F. Giannazzo | E. Schilirò | F. Roccaforte | R. Nigro | P. Fiorenza | B. Galizia | B. Pécz