论文信息 - Interaction of F atoms with SiOCH ultra low-k films. Part II: etching - 字舞流文

Interaction of F atoms with SiOCH ultra low-k films. Part II: etching

K. Maslakov | M. Baklanov | T. Rakhimova | S. Zyryanov | Y. Mankelevich | O. Proshina | A. Palov | D. Lopaev | K. A. Kurchikov | K. Kurchikov