퍼지 시스템과 Particle Swarm Optimization(PSO)을 이용한 Prewarping 기술

In this paper, we concentrate on the mask design problem for optical micro-lithography. The pre-distorted mask is obtained by minimizing the error between the designed output image and the projected output image. We use the particle swarm optimization(PSO) and fuzzy system to insure that the resulting images are identical to the desired image. Our method has good performance for the iteration number by an experiment.