论文信息 - Quality assurance of embedded attenuated phase-shift masks - 字舞流文

Quality assurance of embedded attenuated phase-shift masks

Abstract not available.

Hiroshi Fujita | Naoya Hayashi | Hiroyuki Miyashita | Hisatake Sano | Toshifumi Yokoyama

[1] Hiroshi Fujita,et al. Evaluation of CD metrology tools for photomasks for 0.25-μm devices , 1995, Photomask and Next Generation Lithography Mask Technology.

[2] H. Morimoto,et al. Practical attenuated phase-shifting mask with a single-layer absorptive shifter of MoSiO and MoSiON for ULSI fabrication , 1993, Proceedings of IEEE International Electron Devices Meeting.