High-accuracy laser mask repair technology using ps UV solid state laser

Laser Mask Repair System named LM700A has been developed to satisfy the increasing demands for higher accuracy with thigh throughput photomask repair system in recent semiconductor industry requirements. This paper introduces the basic configuration of the system, evaluated results for Chromium (Cr) binary masks and Molybdenum Silicide (MoSi) HalfTone (HT) phaseshift masks repairing performances, and the features of removing process using mid range (250ps) pulse duration ablation mechanism.