Water diffusion coefficients during copper electropolishing

[1]  Bing Du,et al.  Mechanistic Studies of Cu Electropolishing in Phosphoric Acid Electrolytes , 2004 .

[2]  S. Shue,et al.  Superpolishing for planarizing copper damascene interconnects , 2003 .

[3]  G. Dixit,et al.  Planarization of Copper Thin Films by Electropolishing in Phosphoric Acid for ULSI Applications , 2003 .

[4]  J. Shieh,et al.  Pattern Effects on Planarization Efficiency of Cu Electropolishing , 2002 .

[5]  S. Chung,et al.  Mass transport of phosphoric acid in water: A 1H and 31P pulsed gradient spin-echo nuclear magnetic resonance study , 2000 .

[6]  A. Bernhardt,et al.  Electrochemical planarization of ULSI copper , 1997 .

[7]  H. Chakrabarti.  Anomalies in the ion transport of phosphoric acid in water and heavy-water environments , 1996, Journal of physics. Condensed matter : an Institute of Physics journal.

[8]  A. West,et al.  Copper Electropolishing in Concentrated Phosphoric Acid I . Experimental Findings , 1995 .

[9]  A. West,et al.  Copper Electropolishing in Concentrated Phosphoric Acid II . Theoretical Interpretation , 1995 .

[10]  A. Bernhardt,et al.  Electrochemical Planarization for Multilevel Metallization , 1994 .

[11]  S. Glarum,et al.  The Anodic Dissolution of Copper into Phosphoric Acid I . Voltammetric and Oscillatory Behavior , 1985 .

[12]  S. Glarum,et al.  The Anodic Dissolution of Copper into Phosphoric Acid II . Impedance Behavior , 1985 .

[13]  H. Y. Cheh,et al.  The application of pulsed potential and pulsed current to a rotating disc electrode system , 1979 .

[14]  R. A. Osteryoung,et al.  Pulse voltammetry at rotated electrodes , 1974 .

[15]  S. Prager,et al.  Current transients at a rotating disk electrode produced by a potential step , 1967 .

[16]  T. Hoar,et al.  The influence of solution flow on anodic polishing. Copper in aqueous o-phosphoric acid☆ , 1964 .

[17]  R. Buck,et al.  Chronopotentiometry at Rotating Disk Electrodes. , 1963 .

[18]  J. Edwards.  The Mechanism of Electropolishing of Copper in Phosphoric Acid Solutions II . The Mechanism of Smoothing , 1953 .

[19]  J. Edwards.  The Mechanism of Electropoiishing of Copper in Phosphoric Acid Solutions I . Processes Preceding the Establisment of Polishing Conditions , 1953 .