Thermally stable high effective work function TaCN thin films for metal gate electrode applications
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T. Schram | H. Bender | J. Kittl | C. Adelmann | A. Franquet | L. Ragnarsson | B. O’Sullivan | T. Conard | P. Favia | S. Gendt | J. Meersschaut | Y. Okuno | C. Lohe | S. Elshocht | A. Rothschild | P. Lehnen | Chao Zhao | N. Sengoku | O. Boissière