Reactive phase formation in sputter-deposited Ni/Al multilayer thin films

[1]  C. Michaelsen On the structure and homogeneity of solid solutions: The limits of conventional X-ray diffraction , 1995 .

[2]  S. Qadri,et al.  Reaction kinetics and biasing in Al/Ni multilayers , 1995 .

[3]  E. Altman,et al.  Intermetallic phase formation during annealing of Al/Ni multilayers , 1994 .

[4]  K. Barmak,et al.  A new model for grain boundary diffusion and nucleation in thin film reactions , 1994 .

[5]  D. L. Williamson,et al.  Ion‐beam mixing and solid‐state reaction of Fe‐Zr multilayers , 1993 .

[6]  T. Hufnagel,et al.  Amorphous alloys formed by solid state reaction , 1993 .

[7]  Kwang-Lung Lin,et al.  Interdiffusion of the aluminized and Pt-aluminized coatings on MAR-M247 superalloy , 1992 .

[8]  K. Barmak,et al.  Thin film reaction kinetics of niobium/aluminum multilayers , 1992 .

[9]  T. Hufnagel,et al.  Observation of a rapid amorphization reaction , 1992 .

[10]  C. Thompson,et al.  Nucleation of an intermetallic at thin-film interfaces: VSi 2 contrasted with Al 3 Ni , 1992 .

[11]  K. Larsen,et al.  Ion irradiation induced phase formation in Al–Ni , 1992 .

[12]  C. Thompson On the role of diffusion in phase selection during reactions at interfaces , 1992 .

[13]  W. Keune,et al.  Evidence against amorphous phase formation by the solid state reaction of iron on single-crystal Zr(0001) in ultrahigh vacuum , 1992 .

[14]  M. Chen,et al.  Phase transformation kinetics in thin films , 1992 .

[15]  K. Kelton,et al.  Kinetics of the amorphous to icosahedral phase transformation in AlCuV alloys , 1991 .

[16]  C. Thompson,et al.  Nucleation and growth during reactions in multilayer Al/Ni films: The early stage of Al3Ni formation , 1991 .

[17]  C. Thompson,et al.  Nucleation controlled phase selection in vanadium/amorphous‐silicon multilayer thin films , 1990 .

[18]  C. Thompson,et al.  Quantitative investigation of titanium/amorphous-silicon multilayer thin film reactions , 1990 .

[19]  R. Sinclair,et al.  Metastable Phase Formation in Thin Films and Multilayers , 1990 .

[20]  C. Thompson,et al.  Nucleation‐limited phase selection during reactions in nickel/amorphous‐silicon multilayer thin films , 1990 .

[21]  E. Colgan,et al.  A review of thin-film aluminide formation , 1990 .

[22]  C. Thompson,et al.  Experimental evidence for nucleation during thin‐film reactions , 1989 .

[23]  Mayer,et al.  Solid-state amorphization in Al-Pt multilayers by low-temperature annealing. , 1989, Physical review. B, Condensed matter.

[24]  B. Blanpain,et al.  Solid-state amorphization in Al–Pt thin films , 1988 .

[25]  D. H. Boone,et al.  Structure and hot corrosion behavior of platinum-modified aluminide coatings , 1987 .

[26]  Clemens,et al.  Effect of layer-thickness fluctuations on superlattice diffraction. , 1987, Physical review. B, Condensed matter.

[27]  G. Was,et al.  Metastable phase formation in nickel-aluminum alloys during ion beam mixing , 1987 .

[28]  William L. Johnson,et al.  Thermodynamic and kinetic aspects of the crystal to glass transformation in metallic materials , 1986 .

[29]  Leroy L. Chang,et al.  Synthetic modulated structures , 1985 .

[30]  Robert Schwarz,et al.  Formation of an Amorphous Alloy by Solid-State Reaction of the Pure Polycrystalline Metals , 1983 .

[31]  M. Nastasi,et al.  Ion‐induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin films , 1983 .

[32]  P. Boswell On the calculation of activation energies using a modified Kissinger method , 1980 .

[33]  B. Cullity,et al.  Elements of X-ray diffraction , 1957 .

[34]  H. E. Kissinger Variation of Peak Temperature With Heating Rate in Differential Thermal Analysis , 1956 .