Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
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Scott Daniel Hector | William J. Dauksher | Eric Weisbrod | Pawitter J. S. Mangat | Sang-In Han | Qianghua Xie | S. Hector | W. Dauksher | P. Mangat | Q. Xie | Sang-in Han | E. Weisbrod
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