Interfacial Reactions Between Metal Thin Films and p-GaN

The reactions between Au, Au/Ni and Au/C/Ni thin films on p-GaN have been studied using current-voltage (I-V) measurements, Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS). The metallization schemes consisted of {approx} 2,000 {angstrom} sputtered Au, 1,000 {angstrom} Au/500 {angstrom} Ni, and 1,000 {angstrom} Au/100 {angstrom} C/500 {angstrom} Ni electron beam evaporated. The Au/Ni metallization scheme is of particular interest since it is the basis for the most commonly used ohmic p-type contacts for blue GaN LED`s. Au does not decompose the GaN matrix, while Ni has been shown to react with GaN above a temperature of 400 C for times longer than 5 minutes. Upon decomposition of the GaN by Ni, incorporation of C at the metal/GaN interface occurred. It is believed that a regrowth of GaN occurred, with the surface region being doped with C. Attempts at increasing this doping concentration by introducing an interfacial C layer were not successful.