Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons.

A nanolithography technique based on the interference of surface plasmons (SPs) is proposed and demonstrated to modulate the localized exposure energy. The SP waves participating in interference are excited by two distinct structures, namely, the grating and the nanotaper. Constructive or destructive interference, which ultimately causes an enhanced or reduced modulation to the localized energy, can be obtained merely by adjusting the distance of the grating and the taper. Detailedly speaking, the localized energy can be modulated consecutively with a constant periodicity, and the modulation range of energy is extremely wide, for instance, the maximum energy is nearly 3 orders of magnitude larger than the minimum by our FDTD simulation results. Moreover, since the localized electric field at the taper tip, which leads to the exposure of the photoresist, is extremely sensitive to interference, it suggests a potential way to produce patterns with different depths and critical widths in one chip via beforehand programming and reasonably controlling the corresponding interference of SPs.

[1]  M. Stockman,et al.  Nanofocusing of optical energy in tapered plasmonic waveguides. , 2004, Physical review letters.

[2]  Xiangang Luo,et al.  Subwavelength photolithography based on surface-plasmon polariton resonance. , 2004, Optics express.

[3]  J. Goodberlet,et al.  Patterning Sub-50 nm features with near-field embedded-amplitude masks , 2002 .

[4]  Chunlei Du,et al.  Localized surface plasmon nanolithography with ultrahigh resolution. , 2007, Optics express.

[5]  Jerome P. Silverman,et al.  Challenges and progress in x-ray lithography , 1998 .

[6]  D. Bergman,et al.  Localization versus delocalization of surface plasmons in nanosystems: can one state have both characteristics? , 2001, Physical review letters.

[7]  A. Bouhelier,et al.  Plasmon‐coupled tip‐enhanced near‐field optical microscopy , 2003, Journal of microscopy.

[8]  Anatoly V. Zayats,et al.  Near-field photonics: surface plasmon polaritons and localized surface plasmons , 2003 .

[9]  M. Switkes,et al.  Immersion lithography at 157 nm , 2001 .

[10]  Roderick R. Kunz,et al.  157 nm: Deepest deep-ultraviolet yet , 1999 .

[11]  John Melngailis,et al.  Focused ion beam lithography , 1991 .

[12]  R. H. Stulen,et al.  Extreme ultraviolet lithography , 1998 .

[13]  Xiang Zhang,et al.  Surface plasmon interference nanolithography. , 2005, Nano letters.

[14]  Xiangang Luo,et al.  Surface plasmon resonant interference nanolithography technique , 2004 .

[15]  R. W. Christy,et al.  Optical Constants of the Noble Metals , 1972 .

[16]  R. Blaikie,et al.  Sub-diffraction-limited patterning using evanescent near-field optical lithography , 1999 .

[17]  A. Maradudin,et al.  Nano-optics of surface plasmon polaritons , 2005 .

[18]  Mark A. McCord,et al.  Electron beam lithography for 0.13 μm manufacturing , 1997 .

[19]  D. Bergman,et al.  Self-similar chain of metal nanospheres as efficient nanolens , 2003, InternationalQuantum Electronics Conference, 2004. (IQEC)..

[20]  W. Hinsberg,et al.  Liquid immersion deep-ultraviolet interferometric lithography , 1999 .