Nanosecond laser pulses inducing melting of Si+-implanted SiO2

The author analyses the physical processes involved in laser irradiating Si+-implanted SiO2. In particular he discusses the laser light absorption phenomena and estimates an upper limit for the value of the delay time in energy transfer from Si-implanted impurities to the SiO2 lattice. The role of a delay time in the thermal behaviour of the SiO2 lattice is quantitatively analysed.