Printability verification for double-patterning technology
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Vincent Wiaux | Mireille Maenhoudt | Staf Verhaegen | Kevin Lucas | Christopher Cork | Gerard Luk-Pat | Petrisor Panaite
[1] Apo Sezginer,et al. A rigorous method to determine printability of a target layout , 2007, SPIE Advanced Lithography.
[2] Alfred Kwok-Kit Wong,et al. Resolution enhancement techniques in optical lithography , 2001 .
[3] G.E. Moore,et al. Cramming More Components Onto Integrated Circuits , 1998, Proceedings of the IEEE.
[4] Carlos Fonseca,et al. ACLV driven double-patterning decomposition with extensively added printing assist features (PrAFs) , 2007, SPIE Advanced Lithography.
[5] Hatsuyuki Tanaka,et al. Advanced microlithography process with chemical shrink technology , 2000, Advanced Lithography.
[6] Kohji Hashimoto,et al. A study of mask specification in spacer patterning technology , 2008, Photomask Japan.
[7] Vincent Wiaux,et al. Interactions of double patterning technology with wafer processing, OPC and design flows , 2008, SPIE Advanced Lithography.
[8] Jungchul Park,et al. Dark field Double Dipole Lithography (DDL) for 45nm node and beyond , 2006, Photomask Japan.
[9] Soichi Inoue,et al. Development of hot spot fixer (HSF) , 2006, SPIE Advanced Lithography.
[10] Costas J. Spanos,et al. Automatic hotspot classification using pattern-based clustering , 2008, SPIE Advanced Lithography.
[11] James P. Shiely,et al. Etch modeling in RET synthesis and verification flow , 2005, Photomask Japan.
[12] Mireille Maenhoudt,et al. Alternative process schemes for double patterning that eliminate the intermediate etch step , 2008, SPIE Advanced Lithography.
[13] Min-Chun Tsai. Describing litho-constrained layout by a high-resolution model filter , 2008, Photomask Japan.
[14] Vincent Wiaux,et al. Split and design guidelines for double patterning , 2008, SPIE Advanced Lithography.