Write Endurance in Flash Drives: Measurements and Analysis

We examine the write endurance of USB flash drives using a range of approaches: chip-level measurements, reverse engineering, timing analysis, whole-device endurance testing, and simulation. The focus of our investigation is not only measured endurance, but underlying factors at the level of chips and algorithms--both typical and ideal--which determine the endurance of a device. Our chip-level measurements show endurance far in excess of nominal values quoted by manufacturers, by a factor of as much as 100. We reverse engineer specifics of the Flash Translation Layers (FTLs) used by several devices, and find a close correlation between measured whole-device endurance and predictions from reverse-engineered FTL parameters and measured chip endurance values. We present methods based on analysis of operation latency which provide a non-intrusive mechanism for determining FTL parameters. Finally we present Monte Carlo simulation results giving numerical bounds on endurance achievable by any on-line algorithm in the face of arbitrary or malicious access patterns.

[1]  Donggun Park,et al.  Data retention characteristics of sub-100 nm NAND flash memory cells , 2003, IEEE Electron Device Letters.

[2]  Hong Yang,et al.  Reliability Issues and Models of sub-90nm NAND Flash Memory Cells , 2006, 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings.

[3]  阿米尔·班 Flash File System , 1994 .

[4]  Sivan Toledo,et al.  Competitive analysis of flash memory algorithms , 2011, TALG.

[5]  M. Park,et al.  The Effect of Negative $V_{\rm TH}$ of nand Flash Memory Cells on Data Retention Characteristics , 2009, IEEE Electron Device Letters.

[6]  K. Kimura,et al.  Trends in high-density flash memory technologies , 2003, 2003 IEEE Conference on Electron Devices and Solid-State Circuits (IEEE Cat. No.03TH8668).

[7]  Christian Poellabauer,et al.  Power and performance characteristics of USB flash drives , 2008, 2008 International Symposium on a World of Wireless, Mobile and Multimedia Networks.

[8]  Peter Desnoyers,et al.  Empirical evaluation of NAND flash memory performance , 2010, OPSR.

[9]  Sang Lyul Min,et al.  A space-efficient flash translation layer for CompactFlash systems , 2002, IEEE Trans. Consumer Electron..

[10]  Kinam Kim,et al.  Degradation of tunnel oxide by FN current stress and its effects on data retention characteristics of 90 nm NAND flash memory cells , 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..

[11]  Paul H. Siegel,et al.  Characterizing flash memory: Anomalies, observations, and applications , 2009, 2009 42nd Annual IEEE/ACM International Symposium on Microarchitecture (MICRO).

[12]  Youngjae Kim,et al.  DFTL: a flash translation layer employing demand-based selective caching of page-level address mappings , 2009, ASPLOS.

[13]  Young-Jin Kim,et al.  LAST: locality-aware sector translation for NAND flash memory-based storage systems , 2008, OPSR.

[14]  Sivan Toledo,et al.  Characterizing the Performance of Flash Memory Storage Devices and Its Impact on Algorithm Design , 2008, WEA.

[15]  Anand Kulkarni,et al.  nand Flash Memory and Its Role in Storage Architectures , 2008, Proceedings of the IEEE.

[16]  Tei-Wei Kuo,et al.  The Behavior Analysis of Flash-Memory Storage Systems , 2008, 2008 11th IEEE International Symposium on Object and Component-Oriented Real-Time Distributed Computing (ISORC).

[17]  Sivan Toledo,et al.  Algorithms and data structures for flash memories , 2005, CSUR.

[18]  Philippe Bonnet,et al.  uFLIP: Understanding Flash IO Patterns , 2009, CIDR.

[19]  Heeseung Jo,et al.  A superblock-based flash translation layer for NAND flash memory , 2006, EMSOFT '06.

[20]  Sang-Won Lee,et al.  System Software for Flash Memory: A Survey , 2006, EUC.