Numerical simulation of atomic layer deposition for thin deposit formation in a mesoporous substrate
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I. Kevrekidis | M. Kooshkbaghi | Dennis T. Lee | M. Tsapatsis | G. Dai | Zhen‐liang Xu | Liwei Zhuang | Seungjoon Lee | Peter Corkery
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I. Kevrekidis | M. Kooshkbaghi | Dennis T. Lee | M. Tsapatsis | G. Dai | Zhen‐liang Xu | Liwei Zhuang | Seungjoon Lee | Peter Corkery