Controlled and Uniform Wet Etching of Molybdenum Nanowires
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H. Philipsen | U. Mirsaidov | H. Huynh | F. Holsteyns | A. Pacco | A. R. Chowdhuri | K. Saidov | Z. Aabdin | I. Erofeev | Ke Rong Deng
[1] A. Pacco,et al. Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution , 2023, Journal of Vacuum Science & Technology A.
[2] U. Mirsaidov,et al. Controlling the Wet-Etch Directionality in Nanostructured Silicon , 2022, ACS Applied Electronic Materials.
[3] K. Sankaran,et al. Properties of Ultrathin Molybdenum Films for Interconnect Applications , 2022, SSRN Electronic Journal.
[4] A. Pacco,et al. Controlled ALE-type recess of molybdenum for future logic and memory applications , 2021, 2021 IEEE International Interconnect Technology Conference (IITC).
[5] G. Yeom,et al. Anisotropic/Isotropic Atomic Layer Etching of Metals , 2020, Applied Science and Convergence Technology.
[6] D. Gall. The search for the most conductive metal for narrow interconnect lines , 2020, Journal of Applied Physics.
[7] Q. Le,et al. Controlled cobalt recess for advanced interconnect metallization , 2019, Microelectronic Engineering.
[8] F. Mazzamuto,et al. Study of Copper Surface Preparation by Sequential Atomic Layer Wet Etching and Laser Annealing Treatments , 2017 .
[9] P. Král,et al. Transient Clustering of Reaction Intermediates during Wet Etching of Silicon Nanostructures. , 2017, Nano letters.