A History of Resolution Enhancement Technology
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[1] A. Rosenbluth,et al. A critical examination of submicron optical lithography using simulated projection images , 1983 .
[2] Arthur H. Guenther. International Trends in Applied Optics , 2002 .
[3] Alan E. Rosenbluth,et al. Optimum mask and source patterns to print a given shape , 2002 .
[4] Henry Stark,et al. Image recovery: Theory and application , 1987 .
[5] Burn Jeng Lin. Where Is The Lost Resolution? , 1986, Advanced Lithography.
[6] C. M. Sparrow. On Spectroscopic Resolving Power , 1916 .
[7] Yuichiro Takeuchi,et al. New imaging technique for 64M-DRAM , 1992, Advanced Lithography.
[8] B E Saleh,et al. Image construction: optimum amplitude and phase masks in photolithography. , 1985, Applied optics.
[9] Franklin M. Schellenberg,et al. Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers , 1999, Photomask Technology.
[10] Alfred Kwok-Kit Wong,et al. Resolution enhancement techniques in optical lithography , 2001 .
[11] Akiyoshi Suzuki,et al. Subhalf-micron lithography system with phase-shifting effect , 1992, Advanced Lithography.
[12] Steven R. J. Brueck,et al. Extension of 193-nm immersion optical lithography to the 22-nm half-pitch node , 2004, SPIE Advanced Lithography.
[13] Stephen D. Hsu,et al. Contact hole reticle optimization by using interference mapping lithography (IML) , 2004, Photomask Japan.
[14] Toshiro Tsumori,et al. Effective light source optimization with the modified beam for depth-of-focus enhancements , 1994, Advanced Lithography.
[15] Andrew R. Neureuther,et al. Identifying And Monitoring Effects Of Lens Aberrations In Projection Printing , 1987, Advanced Lithography.
[16] Neal Lafferty,et al. Water immersion optical lithography at 193 nm , 2004 .
[17] Toshiyuki Horiuchi,et al. Resolution Improvement Using Auxiliary Pattern Groups in Oblique Illumination Lithography , 1993 .
[18] B. Lin,et al. Immersion lithography and its impact on semiconductor manufacturing , 2004 .
[19] Bahaa E. A. Saleh,et al. Image construction through diffraction-limited high-contrast imaging systems: an iterative approach , 1985 .
[20] H. Hopkins. On the diffraction theory of optical images , 1953, Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences.
[21] Henry I. Smith,et al. Use of a pi‐phase shifting x‐ray mask to increase the intensity slope at feature edges , 1988 .
[22] Avideh Zakhor,et al. Fast sparse aerial-image calculation for OPC , 1995, Photomask Technology.
[23] C. H. Ting,et al. Proximity Effects And Influences Of Nonuniform Illumination In Projection Lithography , 1982, Advanced Lithography.
[24] S. Vaidya,et al. Mask assisted off‐axis illumination technique for random logic , 1993 .
[25] Alexander Starikov. Use Of A Single Size Square Serif For Variable Print Bias Compensation In Microlithography: Method, Design, And Practice , 1989, Advanced Lithography.
[26] Adriaan van den Bos,et al. Resolution: a survey , 1997 .
[27] Mung Chen,et al. Proximity Effects In Submicron Optical Lithography , 1987, Advanced Lithography.
[28] K. Hikosaka,et al. High performance optical lithography using a separated light source , 1992 .
[29] Yuuki Ishii,et al. Feasibility of immersion lithography , 2004, SPIE Advanced Lithography.
[30] Christophe Pierrat,et al. Automated optical proximity correction: a rules-based approach , 1994, Advanced Lithography.
[31] Isamu Hanyu,et al. Improving projection lithography image illumination by using sources far from the optical axis , 1991 .
[32] Anthony Yen,et al. Illuminator design for the printing of regular contact patterns , 1998 .
[33] Henry I. Smith,et al. Spatial period division—A new technique for exposing submicrometer‐linewidth periodic and quasiperiodic patterns , 1979 .
[34] Konstantinos Adam,et al. Polarization effects in immersion lithography , 2004, SPIE Advanced Lithography.
[35] M. Levenson,et al. Improving resolution in photolithography with a phase-shifting mask , 1982, IEEE Transactions on Electron Devices.
[36] Marc D. Levenson,et al. Extending the lifetime of optical lithography technologies with wavefront engineering , 1994 .
[37] Yuri Granik,et al. New process models for OPC at sub-90-nm nodes , 2003, SPIE Advanced Lithography.
[38] Michael L. Rieger,et al. Fast proximity correction with zone sampling , 1994, Advanced Lithography.
[39] H. Lezec,et al. Extraordinary optical transmission through sub-wavelength hole arrays , 1998, Nature.
[40] Robert Brandom,et al. Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication , 2000, Advanced Lithography.
[41] Takeaki Ebihara,et al. Vortex Mask: Making 80nm contacts with a twist! , 2002, Photomask Technology.
[42] Gregory K. Hearn,et al. 64 To 256 Megabit Reticle Generation: Technology Requirements and Approaches , 1994 .
[43] Q-Han Park,et al. Light emission from the shadows: Surface plasmon nano-optics at near and far fields , 2002 .
[44] M. Levenson,et al. The phase-shifting mask II: Imaging simulations and submicrometer resist exposures , 1984, IEEE Transactions on Electron Devices.