Suppression of threshold voltage variability of double-gate fin field-effect transistors using amorphous metal gate with uniform work function
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K. Endo | Y. Morita | W. Mizubayashi | S. Migita | T. Matsukawa | S. O'Uchi | M. Masahara | H. Ota | Yongxun Liu | H. Yamauchi | Y. Ishikawa | J. Tsukada