Chapter 24 – Silicides
暂无分享，去创建一个
[1] M. Nicolet,et al. Thermal Oxidation of Transition Metal Silicides on Si: Summary , 1984 .
[2] R. Razouk,et al. Characteristics of TaSi2/poly-Si films oxidized in steam for VLSI applications , 1983 .
[3] F. d'Heurle,et al. Interface effects in the formation of silicon oxide on metal silicide layers over silicon substrates , 1983 .
[4] M. Nicolet,et al. Thermal oxidation of cobalt disilicide , 1982 .
[5] Michael E. Thomas,et al. Oxidation of tantalum disilicide/polycrystalline silicon structures in dry O2 , 1982 .
[6] S. Chu,et al. Oxidation of titanium disilicide on polycrystalline silicon , 1982 .
[7] M. Nicolet,et al. Thermal oxidation of nickel disilicide , 1982 .
[8] M. Houng,et al. Oxidation mechanisms in TiSi2 films on single silicon substrates , 1980 .
[9] W. S. Lindenberger,et al. Oxidation of tantalum disilicide on polycrystalline silicon , 1980 .
[10] M. Kashiwagi,et al. Characterization of Thin Film Molybdenum Silicide Oxide , 1980 .
[11] K. Saraswat,et al. Kinetics of the thermal oxidation of WSi2 , 1979 .
[12] A. S. Grove,et al. General Relationship for the Thermal Oxidation of Silicon , 1965 .