Path planning and parameter optimization of uniform removal in active feed polishing

Abstract. A high-quality ultrasmooth surface is demanded in short-wave optical systems. However, the existing polishing methods have difficulties meeting the requirement on spherical or aspheric surfaces. As a new kind of small tool polishing method, active feed polishing (AFP) could attain a surface roughness of less than 0.3 nm (RMS) on spherical elements, although AFP may magnify the residual figure error or mid-frequency error. The purpose of this work is to propose an effective algorithm to realize uniform removal of the surface in the processing. At first, the principle of the AFP and the mechanism of the polishing machine are introduced. In order to maintain the processed figure error, a variable pitch spiral path planning algorithm and the dwell time-solving model are proposed. For suppressing the possible mid-frequency error, the uniformity of the synthesis tool path, which is generated by an arbitrary point at the polishing tool bottom, is analyzed and evaluated, and the angular velocity ratio of the tool spinning motion to the revolution motion is optimized. Finally, an experiment is conducted on a convex spherical surface and an ultrasmooth surface is finally acquired. In conclusion, a high-quality ultrasmooth surface can be successfully obtained with little degradation of the figure and mid-frequency errors by the algorithm.

[1]  Jian Liu,et al.  Dual-rotor tool path generation and removal error analysis in active feed polishing. , 2013, Applied optics.

[2]  Y. Mori,et al.  Processing efficiency of elastic emission machining for low‐thermal‐expansion material , 2008 .

[3]  Hui Fang,et al.  Dwell function algorithm in fluid jet polishing. , 2006, Applied optics.

[4]  Sug-Whan Kim,et al.  Non-sequential optimization technique for a computer controlled optical surfacing process using multiple tool influence functions. , 2009, Optics express.

[5]  刘健 Liu Jian,et al.  Development and Application of Ultra-Smooth Optical Surface Polishing Technology , 2011 .

[6]  Dai Yi-fan Dwell Time Algorithm for MRF of Axis-symmetrical Aspherical Parts , 2004 .

[7]  Jeong-Du Kim Motion analysis of powder particles in EEM using cylindrical polyurethane wheel , 2002 .

[8]  Hans J. Frankena,et al.  Production and measurement of superpolished surfaces , 1992 .

[9]  David D Walker,et al.  Pseudo-random tool paths for CNC sub-aperture polishing and other applications. , 2008, Optics express.

[10]  J. Bennett,et al.  Float polishing of optical materials. , 1987, Applied optics.

[11]  Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry. , 2010, Applied optics.

[12]  Shang Wen Effection of the Material of a Small Tool to the Removal Function in Computer Control Optical Polishing , 2006 .

[13]  Jun Geun Shin,et al.  Characterization of wet pad surface in chemical mechanical polishing (CMP) process with full-field optical coherence tomography (FF-OCT). , 2011, Optics express.

[14]  D. R. Baselt,et al.  Float-polishing process and analysis of float-polished quartz. , 1994, Applied optics.

[15]  YU Jing-chi Analysis of material removal mechanism in fluid jet polishing by finite element method , 2006 .

[16]  Hidekazu Mimura,et al.  Development of a figure correction method having spatial resolution close to 0.1 mm , 2004, SPIE Optics + Photonics.

[17]  F. W. Preston The Theory and Design of Plate Glass Polishing Machines , 1927 .