Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting
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F. Navarro-Villoslada | Víctor Canalejas-Tejero | Carlos Angulo Barrios | María C. Moreno-Bondi | Sergio Carrasco | C. Barrios | Sergio Carrasco | F. Navarro-Villoslada | M. Moreno-Bondi | V. Canalejas-Tejero
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