论文信息 - Chemically deposited alloy semiconductor thin films

Chemically deposited alloy semiconductor thin films

Abstract The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd 1− x Hg x S and Cd 1− x Pb x S alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.

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