Picosecond pulse response characteristics of GaAs metal‐semiconductor‐metal photodetectors

We present a comprehensive theoretical and experimental analysis of the current response of GaAs metal‐semiconductor‐metal Schottky photodiodes exposed to 70 fs optical pulses. Theoretical simulations of the carrier transport in these structures by a self‐consistent two‐dimensional Monte Carlo calculation reveal the strong influence of the distance between the finger electrodes, the external voltage, the GaAs layer thickness and the excitation intensity on the response time and the corresponding frequency bandwidth of these photodetectors. For many experimental conditions, the model demonstrates a clear temporal separation of the electron and hole contributions to the output current due to the different mobilities of the two carrier types. For a diode with an electrode separation of 0.5 μm, an electric‐field strength above 10 kV/cm and low intensity of the incident light the theory predicts a pulse rise time below 2 ps, an initial rapid decay as short as 5 ps associated with the electron sweep out and a subsequent slower tail attributed to the hole current. For weaker electric fields and/or higher light intensities a significant slowing down of the detector speed is predicted because of effective screening of the electric field by the photoexcited carriers. Heterostructure layer‐based devices are shown to provide superior performance compared to diodes manufactured on bulk substrates. Experimental data obtained by photoconductive or electro‐optic sampling on diodes with electrode separation between 0.5 and 1.2 μm agree fairly well with the theoretical predictions.We present a comprehensive theoretical and experimental analysis of the current response of GaAs metal‐semiconductor‐metal Schottky photodiodes exposed to 70 fs optical pulses. Theoretical simulations of the carrier transport in these structures by a self‐consistent two‐dimensional Monte Carlo calculation reveal the strong influence of the distance between the finger electrodes, the external voltage, the GaAs layer thickness and the excitation intensity on the response time and the corresponding frequency bandwidth of these photodetectors. For many experimental conditions, the model demonstrates a clear temporal separation of the electron and hole contributions to the output current due to the different mobilities of the two carrier types. For a diode with an electrode separation of 0.5 μm, an electric‐field strength above 10 kV/cm and low intensity of the incident light the theory predicts a pulse rise time below 2 ps, an initial rapid decay as short as 5 ps associated with the electron sweep out and a s...

[1]  C. C. Moglestue,et al.  A Self-Consistent Monte Carlo Particle Model to Analyze Semiconductor Microcomponents of any Geometry , 1986, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[2]  J. Rosenzweig,et al.  Subpicosecond carrier lifetimes in radiation‐damaged GaAs , 1991 .

[3]  Stefan Zollner,et al.  Intervalley scattering times from the rigid-pseudoion method , 1990, Other Conferences.

[4]  E. H. Bottcher,et al.  Lateral high-speed metal-semiconductor-metal photodiodes on high-resistivity InGaAs , 1990, IEEE Electron Device Letters.

[5]  Woo Seung Lee,et al.  Monolithic GaAs photoreceiver for high-speed signal processing applications , 1986 .

[6]  M. Ito,et al.  Monolithic integration of a metal—semiconductor—metal photodiode and a GaAs preamplifier , 1984, IEEE Electron Device Letters.

[7]  Gerard Mourou,et al.  Theoretical and experimental investigations of subpicosecond photoconductivity , 1989 .

[8]  P. Vettiger,et al.  5.2-GHz bandwidth monolithic GaAs optoelectronic receiver , 1988, IEEE Electron Device Letters.

[9]  Rajaram Bhat,et al.  Optical properties of AlxGa1−x As , 1986 .

[10]  T. Hsiang,et al.  Monte Carlo determination of femtosecond dynamics of hot‐carrier relaxation and scattering processes in bulk GaAs , 1990 .

[11]  O. Wada,et al.  GaAs optoelectronic integrated receiver with high-output fast-response characteristics , 1987, IEEE Electron Device Letters.

[12]  Jean-Luc Pelouard,et al.  Dynamic behavior of photocarriers in a GaAs metal-semiconductor-metal photodetector with sub-half-micron electrode pattern , 1989 .

[13]  M. Zirngibl,et al.  A superlattice GaAs/InGaAs-on-GaAs photodetector for 1.3- mu m applications , 1989, IEEE Electron Device Letters.

[14]  Mohamed A. Osman,et al.  Electron‐hole interaction and high‐field transport of photoexcited electrons in GaAs , 1987 .

[15]  J. Rosenzweig,et al.  Transit time limited response of GaAs metal‐semiconductor‐metal photodiodes , 1991 .

[16]  P. Vettiger,et al.  105-GHz bandwidth metal-semiconductor-metal photodiode , 1988, IEEE Electron Device Letters.

[17]  A. Forchel,et al.  Subpicosecond characterization of carrier transport in GaAs‐metal‐semiconductor‐metal photodiodes , 1991 .

[18]  M. Littlejohn,et al.  Analysis of a GaAs metal-semiconductor-metal (MSM) photodetector with 0.1- mu m finger spacing , 1989, IEEE Electron Device Letters.

[19]  W. Tsang,et al.  GaInAs metal/semiconductor/metal photodetectors with Fe:InP barrier layers grown by chemical beam epitaxy , 1989 .

[20]  E. H. Bottcher,et al.  Very high-speed metal-semiconductor-metal InGaAs:Fe photodetectors with InP:Fe barrier enhancement layer grown by low pressure metalorganic chemical vapour deposition , 1990 .

[21]  M. Cardona,et al.  Intervalley deformation potentials and scattering rates in zinc blende semiconductors , 1989 .

[22]  M. Ito,et al.  Low dark current GaAs metal-semiconductor-metal (MSM) photodiodes using WSi x contacts , 1986 .

[23]  O. Wada,et al.  Very high speed GaInAs metal‐semiconductor‐metal photodiode incorporating an AlInAs/GaInAs graded superlattice , 1989 .

[24]  R. Miller,et al.  Monte Carlo study of photogenerated carrier transport in GaAs surface space‐charge fields , 1989 .

[25]  An investigation of the optoelectronic response of GaAs/InGaAs MSM photodetectors , 1988, IEEE Electron Device Letters.

[26]  M. Littlejohn,et al.  Dark current characteristics of GaAs metal-semiconductor-metal (MSM) photodetectors , 1990 .

[27]  G. D. Alley Interdigital Capacitors and Their Application to Lumped-Element Microwave Integrated Circuits , 1970 .

[28]  Vikram L. Dalal,et al.  Temperature Dependence of Hole Velocity in p‐GaAs , 1971 .

[29]  J. A. Valdmanis,et al.  1 THz-bandwidth proper for high-speed devices and integrated circuits , 1987 .

[30]  Peter A. Houston,et al.  Electron drift velocity in n-GaAs at high electric fields , 1977 .

[31]  G. Mourou,et al.  Subpicosecond electrooptic sampling: Principles and applications , 1986 .

[32]  M. Littlejohn,et al.  Intrinsic and extrinsic response of GaAs metal-semiconductor-metal photodetectors , 1990, IEEE Photonics Technology Letters.

[33]  J. Kash,et al.  Quantitative measurements of intervalley and carrier-carrier scattering in GaAs with hot (e,A0) luminescence , 1989 .

[34]  D. Rogers,et al.  Monolithic integration of a 3-GHz detector/preamplifier using a refractory-gate, ion-implanted MESFET process , 1986, IEEE Electron Device Letters.

[35]  S. M. Sze,et al.  Current transport in metal-semiconductor-metal (MSM) structures , 1971 .

[36]  Hermann Schumacher,et al.  Transit-time limited frequency response of InGaAs MSM photodetectors , 1990 .

[37]  H. Schumacher,et al.  The DSI diode—A fast large-area optoelectronic detector , 1985, IEEE Transactions on Electron Devices.

[38]  V. Dalal HOLE VELOCITY IN p‐GaAs , 1970 .

[39]  R. R. Alfano Ultrafast laser probe phenomena in bulk and microstructure semiconductors III: 18-19 March 1990, San Diego, California , 1987 .