Moving window RtR fault/disturbance tolerant control approach in high-mix semiconductor manufacturing process

In this work, a new state estimation method based on linear model for high-mix semiconductor manufacturing processes is proposed. IMA(1,1) is a general disturbance model adopted in semiconductor manufacturing process, which can reflect the practical process disturbance. Taking IMA(1,1) disturbance into account, our algorithm exerts moving window approach on the linear model of the process and employs minimum norm estimation method to provide better estimates for the states without the IMA(1,1) model parameters. Furthermore, a step fault is considered and our approach can achieve fault-tolerant control. Comparing to the t-EWMA algorithm, this method provide better control performance, which is proved by simulation results.

[1]  N. S. Patel,et al.  Model Context Selection for Run-to-Run Control , 2007, IEEE Transactions on Semiconductor Manufacturing.

[2]  Ruey-Shan Guo,et al.  Age-based double EWMA controller and its application to CMP processes , 2001 .

[3]  David Shan-Hill Wong,et al.  Mixed product run-to-run process control – An ANOVA model with ARIMA disturbance approach , 2009 .

[4]  Jin Wang,et al.  A General Framework for State Estimation in High-Mix Semiconductor Manufacturing , 2007, 2007 American Control Conference.

[5]  S.J. Qin,et al.  Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process , 2005, IEEE Transactions on Semiconductor Manufacturing.

[6]  W. J. Campbell,et al.  Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes , 2006, IEEE Transactions on Semiconductor Manufacturing.

[7]  Ying Zheng,et al.  Stability and performance analysis of mixed product run-torun control , 2006 .

[8]  T.F. Edgar,et al.  Observability and state estimation for multiple product control in semiconductor manufacturing , 2005, IEEE Transactions on Semiconductor Manufacturing.

[9]  Costas J. Spanos,et al.  Fundamentals of Semiconductor Manufacturing and Process Control , 2006 .

[10]  Shi-Shang Jang,et al.  Stability and performance analysis of mixed product run-to-run control , 2006 .

[11]  Thomas F. Edgar,et al.  Missing data estimation for run-to-run EWMA-controlled processes , 2009, Comput. Chem. Eng..

[12]  David Shan-Hill Wong,et al.  Identification of tool and product effects in a mixed product and parallel tool environment , 2009 .

[13]  Thomas F. Edgar,et al.  State estimation in high-mix semiconductor manufacturing , 2009 .

[14]  Thomas F. Edgar,et al.  A new state estimation method for high-mix semiconductor manufacturing processes , 2009 .

[15]  Armann Ingolfsson,et al.  Run by run process control: combining SPC and feedback control , 1995 .

[16]  Duane S. Boning,et al.  Run by run control of chemical-mechanical polishing , 1995, Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'.

[17]  S. Adivikolanu,et al.  Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure , 2000 .

[18]  Sheng-Tsaing Tseng,et al.  Statistical design of double EWMA controller , 2002 .