Recent developments in modelling of liquid phase electroepitaxy under applied magnetic field
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S. Dost | Y. Liu | B. Lent | H. Sheibani
[1] S. Dost,et al. Recent developments in Liquid Phase Electroepitaxial growth of bulk crystals under magnetic field , 2004 .
[2] S. Dost,et al. Growth of bulk single crystals under applied magnetic field by liquid phase electroepitaxy , 2003 .
[3] S. Dost,et al. A three-dimensional numerical simulation model for the growth of CdTe single crystals by the travelling heater method under magnetic field , 2003 .
[4] S. Dost,et al. The effect of applied magnetic field on the growth mechanisms of liquid phase electroepitaxy , 2003 .
[5] S. Dost,et al. A NUMERICAL SIMULATION STUDY FOR THE EFFECT OF APPLIED MAGNETIC FIELD IN GROWTH OF CDTE SINGLE CRYSTALS BY THE TRAVEL HEATER METHOD , 2003 .
[6] S. Dost,et al. Control of transport structures in a rotating liquid cylinder by means of an applied magnetic field , 2003 .
[7] S. Dost,et al. The effect of applied magnetic field on flow structures in liquid phase electroepitaxy—a three-dimensional simulation model , 2002 .
[8] S. Dost,et al. A numerical simulation study for the effect of applied magnetic field in liquid phase electroepitaxy , 2002 .
[9] Donald C. Gillies,et al. Numerical simulation of THM growth of CdTe in presence of rotating magnetic fields (RMF) , 1999 .
[10] V. V. Krapukhin,et al. Seedless THM growth of CdxHg1-xTe (x 0.2) single crystals within rotating magnetic field , 1999 .
[11] Z. Zytkiewicz. Joule effect as a barrier for unrestricted growth of bulk crystals by liquid phase electroepitaxy , 1997 .
[12] S. Dost,et al. A model for liquid phase electroepitaxy under an external magnetic field I. Theory , 1995 .
[13] S. Dost,et al. A continuum model for liquid phase electroepitaxy , 1995 .
[14] K. Benz,et al. CdTe and CdTe0.9Se0.1 crystals grown by the travelling heater method using a rotating magnetic field , 1994 .
[15] J. Baumgartl,et al. The use of magnetohydrodynamic effects to investigate fluid flow in electrically conducting melts , 1993 .
[16] Z. Zytkiewicz. Influence of convection on the composition profiles of thick GaAlAs layers grown by liquid phase electroepitaxy , 1993 .
[17] T. Bryśkiewicz,et al. Growth of alloy substrates by liquid phase electroepitaxy; theoretical considerations , 1993 .
[18] C. Takenaka,et al. Growth of ternary InxGa1−xAs bulk crystals with a uniform composition through supply of GaAs , 1991 .
[19] D.T.J. Hurle,et al. The use of magnetic fields in semiconductor crystal growth , 1991 .
[20] Z. Wasilewski,et al. Properties of very uniform InxGa1−xAs single crystals grown by liquid‐phase electroepitaxy , 1990 .
[21] K. Nakajima. Layer thickness calculation of In1−vGavAs grown by the source-current-controlled method — Diffusion and electromigration limited growth , 1989 .
[22] K. Nakajima. Liquid‐phase epitaxial growth of very thick In1−xGaxAs layers with uniform composition by source‐current‐controlled method , 1987 .
[23] H. Gatos,et al. Bulk GaAs crystal growth by liquid phase electroepitaxy , 1987 .
[24] H. Gatos,et al. Enhancement of interface stability in liquid phase electroepitaxy , 1982 .
[25] H. Gatos,et al. Thickness Uniformity of GaAs Layers Grown by Electroepitaxy , 1978 .
[26] A. Witt,et al. Electromigration in Current‐Controlled LPE , 1976 .