Threshold voltage instability of amorphous silicon thin-film transistors under constant current stress
暂无分享,去创建一个
Kapil Sakariya | Peyman Servati | Arokia Nathan | Shah M. Jahinuzzaman | Afrin Sultana | S. Jahinuzzaman | A. Nathan | P. Servati | K. Sakariya | A. Sultana
[1] Toshihisa Tsukada,et al. Active-Matrix Liquid-Crystal Displays , 2000 .
[2] William I. Milne,et al. Bias-stress-induced creation and removal of dangling-bond states in amorphous silicon thin-film transistors , 1992 .
[3] T. Leroux,et al. Static and dynamic analysis of amorphous-silicon field-effect transistors , 1986 .
[4] A. Nathan,et al. Drain-bias dependence of threshold voltage stability of amorphous silicon TFTs , 2004, IEEE Electron Device Letters.
[5] Ralf B. Wehrspohn,et al. Kinetics of defect creation in amorphous silicon thin film transistors , 2003 .
[6] I. D. French,et al. Bias dependence of instability mechanisms in amorphous silicon thin‐film transistors , 1987 .
[7] Peyman Servati,et al. Above-threshold parameter extraction and modeling for amorphous silicon thin-film transistors , 2003 .
[8] Ralf B. Wehrspohn,et al. Unification of the time and temperature dependence of dangling-bond-defect creation and removal in amorphous-silicon thin-film transistors , 1998 .
[9] J. R. Hughes,et al. Time and temperature dependence of instability mechanisms in amorphous silicon thin-film transistors , 1989 .
[10] S. G. Chamberlain,et al. Compact Spice Modeling and Design Optimization of Low Leakage a-Si:H TFTs for Large-Area Imaging Systems , 1998 .
[11] Robert A. Street,et al. Technology and Applications of Amorphous Silicon , 2000 .
[12] Jackson,et al. Creation of near-interface defects in hydrogenated amorphous silicon-silicon nitride heterojunctions: The role of hydrogen. , 1987, Physical review. B, Condensed matter.
[13] Marshall,et al. Role of hydrogen in the formation of metastable defects in hydrogenated amorphous silicon. , 1989, Physical review. B, Condensed matter.