Ultra-high speed CMOS circuits in thin SIMOX films
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R. L. Field | George K. Celler | S. J. Hillenius | L. E. Trimble | W. S. Lindenberger | J. C. Sturm | A. Kamgar | H.-I. Cong
[1] J. Colinge. Reduction of kink effect in thin-film SOI MOSFETs , 1988, IEEE Electron Device Letters.
[2] George K. Celler,et al. High quality Si‐on‐SiO2 films by large dose oxygen implantation and lamp annealing , 1986 .
[3] J.R. Davis,et al. High-performance SOI-CMOS Transistors in oxygen-implanted silicon without epitaxy , 1987, IEEE Electron Device Letters.
[4] P. K. Vasudev,et al. A High Performance Submicrometer CMOS/SOI Technology Using Ultrathin Silicon Films on Simox , 1987 .
[5] S.D.S. Malhi,et al. SOI-CMOS 4K SRAM with high dose oxygen implanted substrate , 1984, 1984 International Electron Devices Meeting.
[6] H.-I. Cong,et al. Multigigahertz CMOS dual-modulus prescaler IC , 1988 .
[7] S.Y. Chiang,et al. Characteristics of submicrometer CMOS transistors in implanted-buried-oxide SOI films , 1985, 1985 International Electron Devices Meeting.