The invention relates to a multi-beam Ablenkarray means (502) for use in a with a beam (Ib) The charged particle forming particle beam exposure apparatus, said apparatus comprising a plate-like shape having a diaphragm region, which has a the incoming particle beam (Ib) facing toward first side (504), an array of apertures, each permit the passage of a corresponding molded from the particle beam element, a number of depressions (512), each associated with at least one of the apertures, and an array of electrodes (511) wherein each aperture is associated with at least one of the electrodes (511) and each electrode (511) is in one of the recesses (512) and the electrodes are adapted to a non-diffractive state, wherein the light passing through the apertures particles along a desired trajectory can move forward, and a diffractive state wherein di e particles are deflected away from the desired path to realize.