论文信息 - Process integration of Pr-based high-k gate dielectrics - 字舞流文

Process integration of Pr-based high-k gate dielectrics

C. Wenger | P. Zaumseil | T. Schroeder | A. Mane | J. Dabrowski | H. Müssig | R. Sorge | G. Lippert | G. Lupina | G. Weidner