Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components

Abstract We report on recent advances in micro fabrication technology using micromoulding and high-aspect ratio structuring of photopolymer. The direct application is the realization of components for millimeter-size, ultrasonic piezoelectric motors. A new fabrication process using a thick epoxy-based material (SU-8) and the electroplating of nickel is demonstrated. Photopolymer structures have also been realized and released using a positive tone resist as sacrificial layer. The main advantages over past fabrication methods are better design flexibility, simplicity of the fabrication process, the capability to combine metallic materials (Ni) with polymeric materials (SU-8), and the use of positive tone resist as a sacrificial layer.

[1]  Jane M. Shaw,et al.  Micromachining applications of a high resolution ultrathick photoresist , 1995 .

[2]  P. Vettiger,et al.  Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications , 1997, Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97).

[3]  M. Despont,et al.  SU-8: a low-cost negative resist for MEMS , 1997 .

[4]  G.-A. Racine,et al.  Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating , 1994, Proceedings IEEE Micro Electro Mechanical Systems An Investigation of Micro Structures, Sensors, Actuators, Machines and Robotic Systems.

[5]  W. Moreau.  Semiconductor Lithography: Principles, Practices, and Materials , 1987 .

[6]  K. R. Williams,et al.  Etch rates for micromachining processing , 1996 .

[7]  G.-A. Racine,et al.  Hybrid ultrasonic micromachined motors , 1993, [1993] Proceedings IEEE Micro Electro Mechanical Systems.

[8]  Peter Vettiger,et al.  High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS , 1998 .

[9]  P. Vettiger,et al.  High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications , 1997, Proceedings IEEE The Tenth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots.