Interstitial oxygen molecules in amorphous SiO2. III. Measurements of dissolution kinetics, diffusion coefficient, and solubility by infrared photoluminescence

Concentration changes of interstitial oxygen molecules (O2) in amorphous SiO2(a-SiO2) thermally annealed in oxygen atmosphere were examined by the O2 photoluminescence at 1272 nm excited with 765-nm light of titanium sapphire laser. This highly sensitive technique allows the time- and temperature-dependent concentration changes of interstitial O2 due to their incorporation from an oxygen atmosphere to be directly measured. The data provide the dissolution rate, the diffusion coefficient, and the solubility of interstitial O2 in a-SiO2 and are able to exclude interferences from other forms of mobile oxygen species in a-SiO2. These observations confirm that O2 molecules are incorporated into a-SiO2 without separating into monoatomic species, diffuse in a-SiO2 without extensive interaction with the a-SiO2 network, and play a primary role in the thermal oxidation of silicon.

[1]  Kazuya Saito,et al.  Silica glass: A material for photonics , 2000 .

[2]  D. Schiel,et al.  Quantitative analysis of the concentration of interstitial O2 molecules in SiO2 glass using luminescence and Raman spectrometry , 1998 .

[3]  R. Doremus,et al.  Physical Solubility of Gases in Fused Silica , 1966 .

[4]  David L. Griscom,et al.  Defects in SiO[2] and related dielectrics : science and technology , 2000 .

[5]  J. Kilner,et al.  Oxygen self-diffusion and surface exchange studies of oxide electrolytes having the fluorite structure , 1996 .

[6]  F. Riley,et al.  Oxygen mobility in silicon dioxide and silicate glasses: a review , 1992 .

[7]  A. Pasquarello,et al.  Oxygen diffusion through the disordered oxide network during silicon oxidation. , 2002, Physical review letters.

[8]  A. Ikushima,et al.  Reduction of light-scattering loss in silica glass by the structural relaxation of , 1997 .

[9]  D. Schiel,et al.  INFRARED PHOTOLUMINESCENCE OF PREEXISTING OR IRRADIATION-INDUCED INTERSTITIAL OXYGEN MOLECULES IN GLASSY SIO2 AND ALPHA -QUARTZ , 1998 .

[10]  A. Edwards,et al.  Theory of the peroxy-radical defect in a -Si O 2 , 1982 .

[11]  J. Cawley,et al.  Oxygen Tracer Diffusion in Vitreous Silica , 1991 .

[12]  J. Mikkelsen.  Self‐diffusivity of network oxygen in vitreous SiO2 , 1984 .

[13]  F. J. Norton,et al.  Permeation of Gaseous Oxygen through Vitreous Silica , 1961, Nature.

[14]  S T Pantelides,et al.  Reactions and diffusion of water and oxygen molecules in amorphous SiO2. , 2002, Physical review letters.

[15]  C. R. Helms,et al.  18O Tracer Study of Si Oxidation in Dry O 2 Using SIMS , 1988 .

[16]  Bruce E. Deal,et al.  High Pressure Oxidation of Silicon in Dry Oxygen , 1982 .

[17]  Güttler,et al.  Detection of Interstitial Oxygen Molecules in SiO2 Glass by a Direct Photoexcitation of the Infrared Luminescence of Singlet O2. , 1996, Physical review letters.

[18]  T. G. Truscott,et al.  Fourier-transform luminescence spectroscopy of solvated singlet oxygen , 1994 .

[19]  C. R. Helms,et al.  Isotopic tracer studies of oxygen transport through SiO2 films at 1000 °C using secondary ion mass spectrometry , 1986 .

[20]  R. M. Barrer.  89. The mechanism of activated diffusion through silica glass , 1934 .

[21]  J. Shelby.  Helium Migration in Natural and Synthetic Vitreous Silica , 1972 .

[22]  A. E. Geissberger,et al.  Raman studies of vitreous Si O 2 versus fictive temperature , 1983 .

[23]  T. Ishihara,et al.  Oxygen surface exchange and diffusion in LaGaO3 based perovskite type oxides , 1998 .

[24]  Eugene A. Irene,et al.  Models for the oxidation of silicon , 1986 .

[25]  Linards Skuja,et al.  Surface dissolution and diffusion of oxygen molecules in SiO2 glass , 2004 .

[26]  I. Baumvol,et al.  Diffusion of near surface defects during the thermal oxidation of silicon , 1997 .

[27]  D. Hamann.  Diffusion of Atomic Oxygen in SiO 2 , 1998 .

[28]  R. Doremus.  Diffusion of Reactive Molecules in Solids and Melts , 2001 .

[29]  Mark L. Green,et al.  Ultrathin (<4 nm) SiO2 and Si-O-N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits , 2001 .

[30]  R. E. Tressler,et al.  Isotope Labeling Studies of the Oxidation of Silicon at 1000° and 1300°C , 1984 .

[31]  M. Ohring,et al.  Network oxygen exchange during water diffusion in SiO2 , 1981 .

[32]  H. Hosono,et al.  Interstitial oxygen molecules in amorphous SiO2. II. The influence of common dopants (SiOH, SiF, and SiCl groups) and fictive temperature on the decay of singlet photoluminescence , 2005 .

[33]  R. Brückner,et al.  Properties and structure of vitreous silica. I , 1970 .

[34]  W. D. Kingery,et al.  Introduction to Ceramics , 1976 .

[35]  E. Rosencher,et al.  An 18O study of the thermal oxidation of silicon in oxygen , 1979 .

[36]  Minoru Tomozawa,et al.  Water diffusion into silica glass: Structural changes in silica glass and their effect on water solubility and diffusivity☆ , 1995 .

[37]  A. S. Grove,et al.  General Relationship for the Thermal Oxidation of Silicon , 1965 .

[38]  John Crank,et al.  The Mathematics Of Diffusion , 1956 .

[39]  W. M. Jones.  Permeability and Solubility of He3 and He4 in Vitreous Silica1 , 1953 .

[40]  E. L. Williams.  Diffusion of Oxygen in Fused Silica , 1965 .

[41]  A. Stoneham,et al.  Atomic and ionic processes of silicon oxidation , 2001 .

[42]  R. C. Frank,et al.  Diffusion Coefficients of Helium in Fused Quartz , 1961 .

[43]  R. Lee,et al.  Diffusion of Neon Isotopes in Fused Quartz , 1961 .

[44]  Linards Skuja,et al.  Interstitial oxygen molecules in amorphous SiO2. I. Quantitative concentration analysis by thermal desorption, infrared photoluminescence, and vacuum-ultraviolet optical absorption , 2005 .

[45]  E. Sucov.  Diffusion of Oxygen in Vitreous Silica , 1963 .

[46]  Takanobu Watanabe,et al.  Diffusion of Molecular and Atomic Oxygen in Silicon Oxide , 2003 .

[47]  H. Imai,et al.  Reaction kinetics of oxygen-deficient centers with diffusing oxygen molecules in silica glass , 1994 .

[48]  B. Agius,et al.  An 18O Study of the Oxidation Mechanism of Silicon in Dry Oxygen , 1984 .

[49]  R. C. Frank,et al.  Diffusion of Hydrogen and Deuterium in Fused Quartz , 1962 .