Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films
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Feng Liu | Christopher James Lee | Fred Bijkerk | J. M. Sturm | Michael Kolbe | Antonius A.I. Aarnink | Jacobus Marinus Sturm | Erik Darlatt | F. Bijkerk | Christopher J. Lee | A. Aarnink | M. Kolbe | E. Darlatt | Feng Liu
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