E-beam induced X-ray mask repair with optimized gas nozzle geometry

Abstract For high throughput in the repair of clear defects on X-ray masks, it is very important to maximize the growth rate of the deposition process. In a nozzle arrangement, the growth rate is limited by the precursor gas flux. Using a special nozzle geometry, the deposition rate of tungsten was enhanced by a factor of more than 4 compared to a geometry commonly used. In addition, the deposits were characterized by their contrast in X-ray lithography. Their tungsten content was found to increase with increasing gas flux. Hence, the repair time of X-ray masks can be minimized by providing high gas flux.