A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment

Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal’s Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.