State Dynamics and Modeling of Tantalum Oxide Memristors

A key requirement for using memristors in circuits is a predictive model for device behavior that can be used in simulations and to guide designs. We analyze one of the most promising materials, tantalum oxide, for high density, low power, and high-speed memory. We perform an ensemble of measurements, including time dynamics across nine decades, to deduce the underlying state equations describing the switching in Pt/TaOx/Ta memristors. A predictive, compact model is found in good agreement with the measured data. The resulting model, compatible with SPICE, is then used to understand trends in terms of switching times and energy consumption, which in turn are important for choosing device operating points and handling interactions with other circuit elements.

[1]  L. Chua Memristor-The missing circuit element , 1971 .

[2]  L.O. Chua,et al.  Memristive devices and systems , 1976, Proceedings of the IEEE.

[3]  Z. Wei,et al.  Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism , 2008, 2008 IEEE International Electron Devices Meeting.

[4]  R. Williams,et al.  Coupled ionic and electronic transport model of thin-film semiconductor memristive behavior. , 2009, Small.

[5]  D. Stewart,et al.  The missing memristor found , 2009, Nature.

[6]  J. Yang,et al.  Switching dynamics in titanium dioxide memristive devices , 2009 .

[7]  Frederick T. Chen,et al.  Evidence and solution of over-RESET problem for HfOX based resistive memory with sub-ns switching speed and high endurance , 2010, 2010 International Electron Devices Meeting.

[8]  J. Yang,et al.  High switching endurance in TaOx memristive devices , 2010 .

[9]  Myoung-Jae Lee,et al.  Modeling for bipolar resistive memory switching in transition-metal oxides , 2010 .

[10]  R. Williams,et al.  Sub-nanosecond switching of a tantalum oxide memristor , 2011, Nanotechnology.

[11]  Z. Wei,et al.  Demonstration of high-density ReRAM ensuring 10-year retention at 85°C based on a newly developed reliability model , 2011, 2011 International Electron Devices Meeting.

[12]  John Paul Strachan,et al.  The switching location of a bipolar memristor: chemical, thermal and structural mapping , 2011, Nanotechnology.

[13]  D. Ielmini,et al.  Universal Reset Characteristics of Unipolar and Bipolar Metal-Oxide RRAM , 2011, IEEE Transactions on Electron Devices.

[14]  John Paul Strachan,et al.  Spectromicroscopy of tantalum oxide memristors , 2011 .

[15]  Siddharth Gaba,et al.  Synaptic behaviors and modeling of a metal oxide memristive device , 2011 .

[16]  Lin Chen,et al.  Device and SPICE modeling of RRAM devices. , 2011, Nanoscale.

[17]  Leon O. Chua Resistance switching memories are memristors , 2011 .

[18]  Kinam Kim,et al.  A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O(5-x)/TaO(2-x) bilayer structures. , 2011, Nature materials.

[19]  R. Dittmann,et al.  Origin of the Ultra‐nonlinear Switching Kinetics in Oxide‐Based Resistive Switches , 2011 .

[20]  D. Ielmini,et al.  Modeling the Universal Set/Reset Characteristics of Bipolar RRAM by Field- and Temperature-Driven Filament Growth , 2011, IEEE Transactions on Electron Devices.

[21]  J. Yang,et al.  Anatomy of a Nanoscale Conduction Channel Reveals the Mechanism of a High‐Performance Memristor , 2011, Advanced materials.

[22]  D. Strukov,et al.  Thermophoresis/diffusion as a plausible mechanism for unipolar resistive switching in metal–oxide–metal memristors , 2012, Applied Physics A.

[23]  Leon O. Chua,et al.  The Fourth Element , 2012, Proceedings of the IEEE.

[24]  S. Balatti,et al.  Evidence for Voltage-Driven Set/Reset Processes in Bipolar Switching RRAM , 2012, IEEE Transactions on Electron Devices.

[25]  R. Stanley Williams,et al.  Electronic structure and transport measurements of amorphous transition-metal oxides: observation of Fermi glass behavior , 2012, Applied Physics A.

[26]  Shimeng Yu,et al.  A SPICE Compact Model of Metal Oxide Resistive Switching Memory With Variations , 2012, IEEE Electron Device Letters.

[27]  Y. S. Kim,et al.  Integration of 4F2 selector-less crossbar array 2Mb ReRAM based on transition metal oxides for high density memory applications , 2012, 2012 Symposium on VLSI Technology (VLSIT).

[28]  Savel ' Ev Current-Controlled Negative Differential Resistance Due to Joule Heating In Tio2 , 2012 .

[29]  Yuchao Yang,et al.  Complementary resistive switching in tantalum oxide-based resistive memory devices , 2012, 1204.3515.

[30]  J. Yang,et al.  Continuous electrical tuning of the chemical composition of TaO(x)-based memristors. , 2012, ACS nano.

[31]  L. Goux,et al.  Intrinsic Switching Behavior in HfO2 RRAM by Fast Electrical Measurements on Novel 2R Test Structures , 2012, 2012 4th IEEE International Memory Workshop.

[32]  U. Chung,et al.  Modeling for multilevel switching in oxide-based bipolar resistive memory , 2012, Nanotechnology.