Methods for parametric yield control for future 0.1-um deep submicron MOSFET manufacturing

A study to investigate systematic ways of controlling parametric yield for future production of deep submicron MOSFETs has been performed. It is important to know how and where in the manufacturing process the parametric yield can be controlled most efficiently, because for these devices no manufacturing expertise has yet been accumulated. Our study is based on a comparative sensitivity analysis, which has revealed that yield control techniques employed in micron size devices may not be efficient in deep submicron size devices, making a reorientation for manufacturing control mandatory.