Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography
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Gregory Breyta | Linda K. Sundberg | Daniel P. Sanders | R. Sooriyakumaran | P. J. Brock | R. Sooriyakumaran | G. Breyta | L. Sundberg | D. Sanders | P. Brock | R. DiPietro | R. A. Dipietro | A. D. Allen | A. Allen
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