Relationship between Surface Free Energy of Underlying Layers and O3-TEOS Chemical Vapor Deposition
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[1] David-Wei Zhang,et al. Atomic layer deposition of ZnO on thermal SiO2 and Si surfaces using N2-diluted diethylzinc and H2O2 precursors , 2012 .
[2] Y. Shimogaki,et al. Pattern Density Dependency of the Underlying Layer on O3-Tetraethylorthosilicate (TEOS) Film Formation , 2012 .
[3] Yukihiro Shimogaki,et al. Adsorption Model of Organic Molecules on the Surface of Thermally Oxidized Silicon , 2012 .
[4] Y. Shimogaki,et al. O3-TEOS CVD Film Formation on Thermal SiO2 Pre-Coated with Ethanol , 2012 .
[5] A. Kurokawa,et al. Diagnosis and cleaning of carbon contamination on SiO2 thin film (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09)) , 2009 .
[6] Yafei Guo,et al. Surface modification of a biomedical polyethylene terephthalate (PET) by air plasma , 2009 .
[7] Tae-Sik Yoon,et al. Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition , 2008 .
[8] J. Swerts,et al. Atomic Layer Deposition of Hafnium Silicate from HfCl4, SiCl4, and H2O , 2007 .
[9] P. Nikolopoulos,et al. Improved Surface Energy Analysis for Plasma Treated PET Films , 2007 .
[10] Miin-Jang Chen,et al. Enhancement in the efficiency of light emission from silicon by a thin Al2O3 surface-passivating layer grown by atomic layer deposition at low temperature , 2007 .
[11] R. Thurston,et al. Effect of Atmospheric Plasma Treatment On Polymer Surface Energy and Adhesion , 2007 .
[12] Manoj Komath,et al. Plasma surface modification of polystyrene and polyethylene , 2004 .
[13] Wilfried Vandervorst,et al. Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si–O–H) and thermal oxide (SiO2 or Si–O–N) underlayers , 2002 .
[14] H. Komiyama,et al. Tetraethylorthosilicate Vapor Treatment for Eliminating Surface Sensitivity in Tetraethylorthosilicate / O 3 Atmospheric‐Pressure Chemical Vapor Deposition , 1999 .
[15] M. Yoshimaru,et al. Effects of Substrate on the Growth Characteristics of Silicon Oxide Films Deposited by Atmospheric Pressure Chemical Vapor Deposition Using Si ( OC 2 H 5 ) 4 and O 3 , 1998 .
[16] R. Shishoo,et al. Surface properties of polymers treated with tetrafluoromethane plasma , 1997 .
[17] T. Hattori,et al. Identification and Removal of Trace Organic Contamination on Silicon Wafers Stared in Plastic Boxes , 1996 .
[18] N. Dilsiz,et al. Surface energy and mechanical properties of plasma-modified carbon fibers , 1995 .
[19] B. Nguyen,et al. Surface Related Phenomena in Integrated PECVD/Ozone‐TEOS SACVD Processes for Sub‐Half Micron Gap Fill: Electrostatic Effects , 1994 .
[20] Nobuyoshi Sato,et al. Improvement of Gap-Filling Property of O3-tetraethylorthosilicate (TEOS) Film by Ethanol Surface Treatment , 1993 .
[21] K. Fujino,et al. Surface Modification of Base Materials for TEOS / O 3 Atmospheric Pressure Chemical Vapor Deposition , 1992 .
[22] K. Fujino,et al. Dependence of Deposition Characteristics on Base Materials in TEOS and Ozone CVD at Atmospheric Pressure , 1991 .
[23] K. Fujino,et al. Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone , 1990 .
[24] J. Donnet,et al. Microwave plasma treatment effect on the surface energy of carbon fibres , 1987 .
[25] T. L. Dhami,et al. Plasma treatment effect on the surface energy of carbon and carbon fibers , 1986 .
[26] D. H. Kaelble,et al. Dispersion-Polar Surface Tension Properties of Organic Solids , 1970 .
[27] D. Kaelble,et al. A Reinterpretation of Organic Liquid-Polytetrafluoroethylene Surface Interactions , 1970 .
[28] D. K. Owens,et al. Estimation of the surface free energy of polymers , 1969 .