CF/sub 4/ decomposition using inductively coupled plasma: effect of power frequency

The performance evaluation of CF/sub 4/ decomposition efficiency using 2- and 4-MHz power supplies was carried out as a function of the power, the pressure, the flow rate, and the quantity of O/sub 2/ addition. When the 2- and 4-MHz power supplies were used, almost complete CF/sub 4/ removal was achieved at 2.0 and 3.0 kW, respectively, when the CF/sub 4/ flow rate was 0.20 normal liters per minute. The optimum O/sub 2//CF/sub 4/ ratio should be in the range of 1.0/spl sim/1.25 in order to decompose CF/sub 4/ efficiently. The CF/sub 4/ decomposition efficiency using the 2-MHz power supply was significantly higher than that of the 4-MHz power supply under the same power, pressure, and flow rate. Significant amounts of byproducts such as COF/sub 2/ and CO were identified by the Fourier transform infrared spectrophotometer analysis in addition to CO/sub 2/.

[1]  H. Nishiyama,et al.  Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal , 2002 .

[2]  Tomoyuki Kuroki,et al.  Odor control using the AC barrier type plasma reactors , 2000, Conference Record of the 2000 IEEE Industry Applications Conference. Thirty-Fifth IAS Annual Meeting and World Conference on Industrial Applications of Electrical Energy (Cat. No.00CH37129).

[3]  Masaaki Okubo,et al.  Towards ideal NO/sub x/ control technology using a plasma-chemical hybrid process , 2001 .

[4]  Chen-Lu Yang,et al.  Plasma-assisted chemical process for NO/sub x/ control , 2000 .

[5]  A. Mizuno,et al.  NO/sub x/ removal process using pulsed discharge plasma , 1993 .

[6]  A. Kumada,et al.  Low temperature atmospheric pressure discharge plasma processing for volatile organic compounds , 1995 .

[7]  Jen-Shih Chang,et al.  Removal of NF/sub 3/ from semiconductor-process flue gases by tandem packed-bed plasma and adsorbent hybrid systems , 1998 .

[8]  M. Okubo,et al.  Single-stage plasma-chemical process for particulates, NO/sub x/, and SO/sub x/ simultaneous removal , 2001 .

[9]  Jen-Shih Chang,et al.  Removal of C/sub 2/F/sub 6/ from a semiconductor process flue gas by a ferroelectric packed-bed barrier discharge reactor with an adsorber , 2001 .

[10]  H. Shindo,et al.  Warming Potential Reduction of C4F8 Using Inductively Coupled Plasma , 2003 .

[11]  Michael R. Beltran,et al.  Plasma-Assisted Chemical Process for NO Control , 2000 .

[12]  Atsushi Ogata,et al.  Removal of dilute benzene using zeolite-hybrid plasma reactor , 1999, Conference Record of the 1999 IEEE Industry Applications Conference. Thirty-Forth IAS Annual Meeting (Cat. No.99CH36370).

[13]  N. Hayashi,et al.  Treatment of Fluorocarbon Using Nonthermal Plasma Produced by Atmospheric Discharge , 2002 .

[14]  B. Locke,et al.  Diesel engine exhaust cleanup with a pulsed streamer corona reactor equipped with reticulated vitreous carbon electrodes , 1999, Conference Record of the 1999 IEEE Industry Applications Conference. Thirty-Forth IAS Annual Meeting (Cat. No.99CH36370).