论文信息 - Control of electrical resistivity of TaN thin films by reactive sputtering for embedded passive resistors - 字舞流文

Control of electrical resistivity of TaN thin films by reactive sputtering for embedded passive resistors

S. M. Kang | Sungpil Yoon | S. Suh | D. Yoon | Sunyoung Yoon

[2] K. Baba,et al. Synthesis and properties of tantalum nitride films formed by ion beam assisted deposition , 1996 .

[3] M. Tsai,et al. Comparison of the diffusion barrier properties of chemical-vapor-deposited TaN and sputtered TaN between Cu and Si , 1996 .

[4] J. E. Angelo,et al. Adhesion and fracture of tantalum nitride films , 1998 .

[5] Weng-Sing Hwang,et al. Study of phase transition and electrical resistivity of tantalum nitride films prepared by DC magnetron sputtering with OES detection system , 2001 .

[6] Jing‐Cheng Lin,et al. Characterization of tantalum nitride films deposited by reactive sputtering of Ta in N2/Ar gas mixtures , 2001 .

[7] T. Laurila,et al. Reactive sputter deposition and properties of Ta x N thin films , 2002 .

[8] Sunjung Kim,et al. Deposition of tantalum nitride thin films by D.C. magnetron sputtering , 2005 .

[9] Heon-Ju Lee,et al. Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering , 2005 .

[10] G. Min,et al. Embedded Passive Resistors: Challenges and Opportunities For Conducting Polymers , 2005 .