Device Fabrication by Scanned Probe Oxidation

Precision Engineering Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. E-mail: john.dagata@nist.gov Imaging by scanning a tiny probe across a surface is a well-established technique for nanometer microscopy; now researchers are using these probes to manipulate matter and create small structures. In his Perspective, Dagata describes “an important milestone” reported in the same issue by Snow and Campbell (p. 1639), in which small oxidized structures were created with a scanning probe microscope.

[1]  G. Binnig,et al.  Scanning tunneling microscopy , 1984 .

[2]  Michael T. Postek,et al.  Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air , 1990 .

[3]  D. Eigler,et al.  Atomic and Molecular Manipulation with the Scanning Tunneling Microscope , 1991, Science.

[4]  J. Schneir,et al.  Integration of scanning tunneling microscope nanolithography and electronics device processing , 1992 .

[5]  Hiroshi Masuhara,et al.  Tip‐induced anodization of titanium surfaces by scanning tunneling microscopy: A humidity effect on nanolithography , 1993 .

[6]  David R. Allee,et al.  Selective area oxidation of silicon with a scanning force microscope , 1993 .

[7]  P. McMarr,et al.  Fabrication of silicon nanostructures with a scanning tunneling microscope , 1993 .

[8]  Writing electronic nanometer structures into porous Si films by scanning tunneling microscopy , 1994 .

[9]  Khaldoon Abugharbieh,et al.  25 nm chromium oxide lines by scanning tunneling lithography in air , 1994 .

[10]  Kang L. Wang,et al.  Nanometer‐structure writing on Si(100) surfaces using a non‐contact‐mode atomic force microscope , 1994 .

[11]  Hyongsok T. Soh,et al.  Fabrication of 0.1 um metal oxide semiconductor field-effect transistors with the atomic force microscope , 1995 .

[12]  Calvin F. Quate,et al.  Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation , 1995 .

[13]  M. Ishii,et al.  Control of Current in 2DEG Channel by Oxide Wire Formed Using AFM , 1995 .

[14]  Calvin F. Quate,et al.  NANOMETER SCALE LITHOGRAPHY AT HIGH SCANNING SPEEDS WITH THE ATOMIC FORCE MICROSCOPE USING SPIN ON GLASS , 1995 .

[15]  L. Ley,et al.  Nanometer‐scale modification of the tribological properties of Si(100) by scanning force microscope , 1995 .

[16]  C. Schönenberger,et al.  Fabrication of metallic nanowires with a scanning tunneling microscope , 1995 .

[17]  M. Hoshi,et al.  Application of STM Nanometer-Size Oxidation Process to Planar-Type MIM Diode , 1995 .

[18]  E. S. Snow,et al.  AFM Fabrication of Sub-10-Nanometer Metal-Oxide Devices with in Situ Control of Electrical Properties , 1995, Science.