Chemical processes in glass polishing
暂无分享,去创建一个
[1] F. W. Preston. The Theory and Design of Plate Glass Polishing Machines , 1927 .
[2] F. Ernsberger. Attack of Glass by Chelating Agents , 1959 .
[3] P. Gielisse,et al. HARDNESS OF NONMETALLIC SOLIDS ON AN ATOMIC BASIS , 1962 .
[4] L. Holland,et al. The properties of glass surfaces , 1964 .
[5] George A. Parks,et al. The Isoelectric Points of Solid Oxides, Solid Hydroxides, and Aqueous Hydroxo Complex Systems , 1965 .
[6] F. R. Cannings,et al. Structure and properties of acid sites in a mixed-oxide system. I. Synthesis and infrared characterization , 1970 .
[7] B. Lawn,et al. Indentation fracture: principles and applications , 1975 .
[8] A. Franks,et al. Materials problems in the production of high quality optical surfaces , 1975 .
[9] Lesile Glasser. The chemistry of silica: By Ralph K. Iller. Pp. vii+ 866. Wiley, Chichester. 1979, £39.50 , 1980 .
[10] C. Das. Chemical Durability of Sodium Silicate Glasses Containing AI2O3 and ZrO2 , 1981 .
[11] J. Tait,et al. The effect of Zn(II) ion adsorption on the durability of sodium borosilicate glasses , 1982 .
[12] M. Tomozawa,et al. Crack Blunting of High‐Silica Glass , 1982 .
[13] R. Bartholomew. High-water containing glasses , 1983 .
[14] M. Nogami,et al. Diffusion of water in high silica glasses at low temperature , 1984 .
[15] Effect of Stress on Water Diffusion in Silica Glass , 1984 .
[16] Norman J. Brown. Preparation of Ultrasmooth Surfaces , 1986 .
[17] N. J. Brown. Some speculations on the mechanisms of abrasive grinding and polishing , 1987 .
[18] Y. Mori,et al. Elastic Emission Machining , 1987 .
[19] Kazuto Yamauchi,et al. Mechanism of atomic removal in elastic emission machining , 1988 .
[20] W. Hertl. Surface chemistry of zirconia polymorphs , 1989 .
[21] M. Tomozawa,et al. Diffusion of water into a borosilicate glass , 1989 .
[22] Minoru Tomozawa,et al. Diffusion of Water into Silica Glass at Low Temperature , 1989 .