Electrical properties of atomic layer deposited HfO2/Al2O3 multilayer on diamond
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Jiangwei Liu | Masataka Imura | Meiyong Liao | Eiichiro Watanabe | Yasuo Koide | Jiangwei Liu | M. Liao | Y. Koide | E. Watanabe | M. Imura | H. Oosato | H. Oosato
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