Sputter deposition of TiNi, TiNiPd and TiPd films displaying the two-way shape-memory effect

Abstract TiNi, TiNiPd and TiPd films exhibiting the one-way and two-way shape-memory effect have been prepared by d.c. magnetron sputtering onto unheated substrates followed by annealing and training processes. In the case of TiNi, films could be prepared showing the R-phase transition, the important feature of which is its small hysteresis of about 1 K. By the Ni-Pd substitution the transition temperatures (austenite/martensite finish temperatures) could be increased from 32 °C/–38 °C for the binary NiTi alloy to a maximum of 570 °C/498 °C for TiPd films. The films have been subject to further microstructuring for developing micro-actuators displaying the two-way shape-memory effect.

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