Interferometric back focal plane microellipsometry.

We present a technique for ellipsometric analysis of materials with high lateral resolution. A Michelson-type phase-shifting interferometer measures the phase distribution in the back focal plane of a high numerical aperture objective. Local measurements of the ellipsometric parameter delta are performed over the entire spectrum of angles of incidence. We show that delta is to leading order linearly proportional to the phase change on reflection of normally incident light. We furthermore invert the Fresnel reflection equations and derive expressions for the real and imaginary parts of the refractive index as functions of the phase change on reflection and the reflectivity at normal incidence, both of which are measurable with the same apparatus. Hence we accomplish local measurements of the refractive indices of our samples. Determination of the phase change on reflection permits correction of interferometric topography measurements of heterogeneous specimens.