Large MEMS-based programmable reflective slit mask for multi-object spectroscopy fabricated using multiple wafer-level bonding

Multi-object spectroscopy (MOS) allows measuring infrared spectra of faint astronomical objects that provides information on the evolution of the Universe. MOS requires a slit mask for object selection at the focal plane of the telescope. We are developing MEMS-based programmable reflective slit masks composed of 2048 individually addressable micromirrors. Each micromirror measures 100 × 200 μm2 and is electrostatically tilted by a precise angle of at least 20°. The main requirements for these arrays are precise and uniform tilt angle over the whole device, uniformity of the mirror electromechanical behavior, a flat mirror deformation and individual addressing capability of each mirror. This capability of our array is achieved using a line-column algorithm based on an optimized tilt angle/voltage hysteresis of the electrostatic actuator. Micromirror arrays composed of 2048 micromirrors (32 × 64) and modeled for individual addressing were fabricated using fusion and eutectic wafer-level bonding. These micromirrors without coating demonstrated a peak-to-valley deformation less than 8 nm and a tilt angle of 24° for an actuation voltage of 130 V. A first experiment of the linecolumn algorithm was demonstrated by actuating individually 2 × 2 micromirrors. In order, to avoid spoiling of the optical source by the thermal emission of the instrument, the micromirror array has to work in a cryogenic environment. Therefore, these devices were characterized in a cryogenic environment at -111°C and several lines of micromirrors were tilted successfully under these conditions.