论文信息 - Al2O3 ‐ Ta2O5 ‐ ZrO2 Thin Films Having High Corrosion Resistance to Strong Acid and Alkali Solutions

Al2O3 ‐ Ta2O5 ‐ ZrO2 Thin Films Having High Corrosion Resistance to Strong Acid and Alkali Solutions

In order to develop an insulator film for an electrolyte-insulator-semiconductor capacitor pH sensor which can be used in a wide pH range, the corrosion resistance of Al 2 O 3 -Ta 2 O 5 -ZrO 2 films formed by metallorganic chemical vapor deposition has been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HCI and 1 M NaOH solutions. The films with the cationic mole fraction of Al, X A l , smaller than 0.4, the cationic mole fraction of Ta, X T a , larger than 0.3, and the cationic mole fraction of Zr, X Z r , larger than 0.3 showed high corrosion resistance against both solutions.

N. Hara | K. Sugimoto | N. Akao | S. Katayama

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