论文信息 - Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Reliable high power 193nm ArF light source is desired for the successive growth of ArF-immersion technology for 45nm node generation. In 2006, Gigaphoton released GT60A, high power injection locked 6kHz/60W/0.5pm (E95) laser system, to meet the demands of semiconductor markets. In this paper, we report key technologies for reliable mass production GT laser systems and GT60A high durability performance test results up to 20 billion pulses.

[1] T. Suganuma,et al. Development of a 5 kHz Ultra-Line-Narrowed F2 Laser for Dioptric Projection Systems. , 2002 .

[2] Shinji Nagai,et al. GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography , 2006, SPIE Advanced Lithography.

[3] Takahito Kumazaki,et al. Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography , 2008, SPIE Advanced Lithography.

[4] Shinji Nagai,et al. High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography , 2008, SPIE Advanced Lithography.

[5] Yoshihiro Watanabe,et al. High-power injection lock laser platform for ArF dry/wet lithography , 2005, SPIE Advanced Lithography.

[6] Shinji Nagai,et al. Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool , 2007, SPIE Advanced Lithography.

[7] Tatsuya Ariga,et al. Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems , 2002, SPIE Advanced Lithography.

[8] T. Suzuki,et al. High power injection lock 6 kHz 60 W laser for ArF dry/wet lithography , 2006, SPIE Advanced Lithography.