Super-resolution and ultrahigh-throughput of focused-ion-beam machining

Recent studies have demonstrated lateral super-resolution of focused-ion-beam machining by sacrificial masking films. However, the experimental limits of this process are unclear and lack a theoretical basis. We report the first comprehensive study of the super-resolution effect, integrating several new concepts. First, we present chromia as an advantageous masking material, characterizing its nanometer roughness, uniform structure, and amorphous state. Second, we develop an efficient method of in-line metrology of ion-beam focus by scanning electron microscopy, characterizing resolution and enabling reproducibility. Third, we mill complex nanostructures through chromia and into silica, characterizing the response of the bilayer system to a focused beam of gallium cations. Fourth, we derive a theoretical model that predicts lateral super-resolution across experimental studies and elucidates temporal efficiency. Our study elucidates the resolution-throughput tradespace of focused-ion-beam machining, demonstrating surprising trends and dramatic improvements of volume throughput that enable a paradigm shift from prototyping to manufacturing.

[1]  M. H. Quenouille.  Problems in Plane Sampling , 1949 .

[2]  A. Savitzky,et al.  Smoothing and Differentiation of Data by Simplified Least Squares Procedures. , 1964 .

[3]  B. Bhushan.  Characterization of r.f.-sputter-deposited chromium oxide films ☆ , 1980 .

[4]  B. Efron,et al.  The Jackknife Estimate of Variance , 1981 .

[5]  D. J. Barber.  Transmission Electron Microscopy. Physics of Image Formation and Microanalysis , 1984 .

[6]  L. Reimer.  Scanning Electron Microscopy: Physics of Image Formation and Microanalysis , 1984 .

[7]  R. Ku,et al.  Electrical conductivity in sputter-deposited chromium oxide coatings , 1985 .

[8]  Elsa Reichmanis,et al.  Chemical amplification mechanisms for microlithography , 1991 .

[9]  J. Melngailis,et al.  Focused ion beam induced deposition and ion milling as a function of angle of ion incidence , 1992 .

[10]  D. W. Scott,et al.  Multivariate Density Estimation, Theory, Practice and Visualization , 1992 .

[11]  Barry N. Taylor,et al.  Guidelines for Evaluating and Expressing the Uncertainty of Nist Measurement Results , 2017 .

[12]  J. Giérak,et al.  New characterization method of ion current‐density profile based on damage distribution of Ga+ focused‐ion beam implantation in GaAs , 1993 .

[13]  J. Villarrubia.  Algorithms for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation , 1997, Journal of research of the National Institute of Standards and Technology.

[14]  F. Lévy,et al.  Characterization of sputter-deposited chromium oxide thin films , 1999 .

[15]  Hiroshi Ito.  Chemically amplified resists: past, present, and future , 1999, Advanced Lithography.

[16]  Lucille A. Giannuzzi,et al.  Ion channeling effects on the focused ion beam milling of Cu , 2001 .

[17]  Alfred Wagner,et al.  High Resolution Focused Ion Beams: FIB and Its Applications , 2003 .

[18]  David Izraelevitz,et al.  A Fast Algorithm for Approximate Viewshed Computation , 2003 .

[19]  Petr Klapetek,et al.  Theoretical analysis of the atomic force microscopy characterization of columnar thin films. , 2003, Ultramicroscopy.

[20]  Patrick P. Naulleau,et al.  Nanoscale topography control for the fabrication of advanced diffractive optics , 2003 .

[21]  B Münch,et al.  Three‐dimensional analysis of porous BaTiO3 ceramics using FIB nanotomography , 2004, Journal of microscopy.

[22]  Heiji Watanabe,et al.  Antistatic Technique for Suppressing Charging in Focused Ion Beam Systems Using Microprobing and Ion-Beam-Assisted Deposition , 2005 .

[23]  Michael T. Postek,et al.  Scanning electron microscope dimensional metrology using a model‐based library , 2005 .

[24]  J. Villarrubia,et al.  Advanced electron microscopy needs for nanotechnology and nanomanufacturing , 2005 .

[25]  Masaaki Yoshida,et al.  Novel charge neutralization techniques applicable to wide current range of FIB processing in FIB-SEM combined system , 2006, Microelectron. Reliab..

[26]  Roderick Boswell,et al.  High brightness inductively coupled plasma source for high current focused ion beam applications , 2006 .

[27]  T. Vystavěl,et al.  Focused ion beam (FIB) milling of electrically insulating specimens using simultaneous primary electron and ion beam irradiation , 2007 .

[28]  A. Volinsky,et al.  Microstructure and mechanical properties of chromium oxide coatings , 2007 .

[29]  J. Ziegler,et al.  SRIM – The stopping and range of ions in matter (2010) , 2010 .

[30]  Tuan Vo-Dinh,et al.  Fabrication of nanodot plasmonic waveguide structures using FIB milling and electron beam-induced deposition. , 2009, Scanning.

[31]  K. Jiang,et al.  Characterisation of FIB milling yield of metals by SEM stereo imaging technique , 2009 .

[32]  M. Urbánek,et al.  Focused ion beam fabrication of spintronic nanostructures: an optimization of the milling process , 2010, Nanotechnology.

[33]  Ronald G. Dixson,et al.  Proximity-associated errors in contour metrology , 2010, Advanced Lithography.

[34]  B. Min,et al.  Prediction of nanopattern topography using two-dimensional focused ion beam milling with beam irradiation intervals , 2010 .

[35]  J. Hossain,et al.  Temperature effect on the electrical properties of chromium oxide (Cr 2 O 3 ) thin films , 2011 .

[36]  V. Mussi,et al.  DNA detection with a polymeric nanochannel device. , 2011, Lab on a chip.

[37]  P. Kulla,et al.  Edge Detection with Sub-pixel Accuracy Based on Approximation of Edge with Erf Function , 2011 .

[38]  J Michael Ramsey,et al.  Fabrication of sub-5 nm nanochannels in insulating substrates using focused ion beam milling. , 2011, Nano letters.

[39]  Saulius Juodkazis,et al.  Control of surface charge for high‐fidelity nanostructuring of materials , 2013 .

[40]  Hans Janssen,et al.  Monte-Carlo based uncertainty analysis: Sampling efficiency and sampling convergence , 2013, Reliab. Eng. Syst. Saf..

[41]  K. Khojier,et al.  Structural, mechanical and tribological characterization of chromium oxide thin films prepared by post-annealing of Cr thin films , 2013 .

[42]  Bin Ming,et al.  10nm three-dimensional CD-SEM metrology , 2014, Advanced Lithography.

[43]  D. Maas,et al.  High-resolution direct-write patterning using focused ion beams , 2014 .

[44]  K. Suh,et al.  Replication of flexible polymer membranes with geometry-controllable nano-apertures via a hierarchical mould-based dewetting , 2014, Nature Communications.

[45]  F. Rajab,et al.  Structural and optical characterization of Cr2O3 nanostructures: Evaluation of its dielectric properties , 2014 .

[46]  B. Ooi,et al.  Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer , 2015 .

[47]  R. J. Kline,et al.  Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library. , 2015, Ultramicroscopy.

[48]  Antonio M. Possolo,et al.  Simple Guide for Evaluating and Expressing the Uncertainty of NIST Measurement Results , 2015 .

[49]  Mirna Mihovilovic Skanata,et al.  Entropic cages for trapping DNA near a nanopore , 2015, Nature Communications.

[50]  S. Ratchev,et al.  Apparent beam size definition of focused ion beams based on scanning electron microscopy images of nanodots , 2015 .

[51]  S. Subramaniam,et al.  Focused ion beams in biology , 2015, Nature Methods.

[52]  Thomas Lafarge,et al.  The NIST Uncertainty Machine , 2015 .

[53]  N. Borgardt,et al.  Prediction of surface topography due to finite pixel spacing in FIB milling of rectangular boxes and trenches , 2016 .

[54]  S. Brueck,et al.  Top-down, in-plane GaAs nanowire MOSFETs on an Al2O3 buffer with a trigate oxide from focused ion-beam milling and chemical oxidation , 2016, Nanotechnology.

[55]  A. Alec Talin,et al.  High-contrast and fast electrochromic switching enabled by plasmonics , 2016, Nature Communications.

[56]  A. Kannegulla,et al.  Metal assisted focused-ion beam nanopatterning , 2016, Nanotechnology.

[57]  Chris A. Mack,et al.  Improvements to the analytical linescan model for SEM metrology , 2016, SPIE Advanced Lithography.

[58]  J Alexander Liddle,et al.  Nanomanufacturing: A Perspective. , 2016, ACS nano.

[59]  Jianchun Dong,et al.  Fabrication and characterization of highly reproducible, high resistance nanogaps made by focused ion beam milling , 2017 .

[60]  B. Cui,et al.  Chromium oxide as a hard mask material better than metallic chromium , 2017 .

[61]  H. Lezec,et al.  Subnanometer structure and function from ion beams through complex fluidics to fluorescent particles. , 2017, Lab on a chip.

[62]  Justin D. Holmes,et al.  New Generation Electron Beam Resists: A Review , 2017 .

[63]  J. Ramsey,et al.  Enhanced nanochannel translocation and localization of genomic DNA molecules using three-dimensional nanofunnels , 2017, Nature Communications.

[64]  Ting Xu,et al.  Surface plasmon polariton laser based on a metallic trench Fabry-Perot resonator , 2017, Science Advances.

[65]  Joshua A. Taillon,et al.  Teaching an Old Material New Tricks: Easy and Inexpensive Focused Ion Beam (FIB) Sample Protection Using Conductive Polymers , 2017, Microscopy and Microanalysis.

[66]  Johannes E. Fröch,et al.  Photonic crystal cavities from hexagonal boron nitride , 2018, Nature Communications.

[67]  L. Ocola,et al.  Fabrication of phonon-based metamaterial structures using focused ion beam patterning , 2018 .

[68]  R. Victora,et al.  A fully electric field driven scalable magnetoelectric switching element , 2018 .

[69]  Seung-Woo Lee,et al.  Precise Edge Detection Method Using Sigmoid Function in Blurry and Noisy Image for TFT-LCD 2D Critical Dimension Measurement , 2018 .

[70]  C. Tasan,et al.  Preventing damage and redeposition during focused ion beam milling: The "umbrella" method. , 2018, Ultramicroscopy.

[71]  Craig R. Copeland,et al.  Subnanometer localization accuracy in widefield optical microscopy , 2017, Light: Science & Applications.

[72]  D. López,et al.  Ultrafast photonic micro-systems to manipulate hard X-rays at 300 picoseconds , 2019, Nature Communications.

[73]  B. Alemán,et al.  A fast, sensitive, room-temperature graphene nanomechanical bolometer , 2019 .

[74]  Chris A. Mack.  Will stochastics be the ultimate limiter for nanopatterning? , 2019, Advanced Lithography.

[75]  Estimation of uncertainty of percentile values in particle size distribution analysis as a function of number of particles , 2019, Advanced Powder Technology.

[76]  R. Spolenak,et al.  Achieving micron-scale plasticity and theoretical strength in Silicon , 2020, Nature Communications.

[77]  Xuecheng Fu,et al.  Homogenous and ultra-shallow lithium niobate etching by focused ion beam , 2020 .

[78]  K. Inaba,et al.  X-ray thin-film measurement techniques VI . Small Angle X-ray Scattering , 2022 .